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| Document Title | Author Full Name | Author Short Name | Index | Corresponding | Address | ResearcherID | ResearcherID Author Name | ORCID | ORCID Author Name | Related Email |
|---|---|---|---|---|---|---|---|---|---|---|
| Fabrication of very-high-strength pure copper with fine grain structure through multi-axial diagonal forging | Lee, Jae Kun | Lee, JK | 1 | Poongsan, Angang 38026, South Korea | sh.park@knu.ac.kr; | |||||
| Fabrication of very-high-strength pure copper with fine grain structure through multi-axial diagonal forging | Kwon, Sang-Chul | Kwon, SC | 2 | Gangneung Wonju Natl Univ, Kangnung 25457, South Korea | sh.park@knu.ac.kr; | |||||
| Fabrication of very-high-strength pure copper with fine grain structure through multi-axial diagonal forging | Jeong, Hyo-Tae | Jeong, HT | 3 | Gangneung Wonju Natl Univ, Kangnung 25457, South Korea | sh.park@knu.ac.kr; | |||||
| Fabrication of very-high-strength pure copper with fine grain structure through multi-axial diagonal forging | Han, Sang-Ho | Han, SH | 4 | Korea Inst Mat Sci, Chang Won 51508, South Korea | sh.park@knu.ac.kr; | |||||
| Fabrication of very-high-strength pure copper with fine grain structure through multi-axial diagonal forging | Park, Sung Hyuk | Park, SH | 5 | 교신저자 | Kyungpook Natl Univ, Daegu 41566, South Korea | AAE-6726-2022 | Park, Sung-Hyuk | sh.park@knu.ac.kr; | ||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Kim, Se Yun | Kim, SY | 1 | 교신저자 | Samsung Adv Inst Technol, Inorgan Mat Lab, Suwon 16678, South Korea | N-5248-2019 | Kim, Seung | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | ||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Shin, Weon Ho | Shin, WH | 2 | Kwangwoon Univ, Dept Elect Mat Engn, Seoul 01897, South Korea | AAH-4031-2020 | Shin, Weon | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | |||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Jung, Doh Won | Jung, DH | 3 | Samsung Adv Inst Technol, Inorgan Mat Lab, Suwon 16678, South Korea | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | |||||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Ko, Dong-Su | Ko, DS | 4 | Samsung Adv Inst Technol, Autonomous Mat Dev Lab, Suwon 16678, South Korea | AAZ-5644-2020 | Ko, Dong-Su | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | |||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Roh, Jong Wook | Roh, JW | 5 | Kyungpook Natl Univ, Sch Nano & Mat Sci & Engn, Sangju 37224, South Korea | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | |||||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Hwang, Sungwoo | Hwang, S | 6 | Samsung Adv Inst Technol, Inorgan Mat Lab, Suwon 16678, South Korea | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | |||||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Lee, Jongmin | Lee, J | 7 | Samsung Adv Inst Technol, Inorgan Mat Lab, Suwon 16678, South Korea | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | |||||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Lee, Kimoon | Lee, K | 8 | Kunsan Natl Univ, Dept Phys, Gunsan 54150, South Korea | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | |||||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Park, Hee Jung | Park, HJ | 9 | Dankook Univ, Dept Mat Sci & Engn, Cheonan 31116, South Korea | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; | |||||
| Facile and accelerated production of RuO2 monolayers via a dual-step intercalation process | Kwak, Chan | Kwak, K | 10 | Samsung Adv Inst Technol, Inorgan Mat Lab, Suwon 16678, South Korea | seyuni.kim@samsung.com;hyunsik.kim@hongik.ac.kr; |
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