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Document Title Author Full Name Author Short Name Index Corresponding Address ResearcherID ResearcherID Author Name ORCID ORCID Author Name Related Email
Dependence of magnetic performance on coating method in grain boundary diffusion processed Nd-Fe-B sintered magnets Lee, Sang Hyub Lee, SH 7 Star Grp, R&D Ctr, Daegu 42714, South Korea kimdhwan@dgist.ac.kr;jkim@dgist.ac.kr;
Dependence of magnetic performance on coating method in grain boundary diffusion processed Nd-Fe-B sintered magnets Kim, Sumin Kim, S 8 Korea Inst Mat Sci, Dept Magnet Mat, Chang Won 51508, South Korea kimdhwan@dgist.ac.kr;jkim@dgist.ac.kr;
Dependence of magnetic performance on coating method in grain boundary diffusion processed Nd-Fe-B sintered magnets Roh, Jong Wook Roh, JW 9 Kyungpook Natl Univ, Sch Nano & Mat Sci & Engn, Daegu 37224, Gyeongsangbug D, South Korea kimdhwan@dgist.ac.kr;jkim@dgist.ac.kr;
Dependence of magnetic performance on coating method in grain boundary diffusion processed Nd-Fe-B sintered magnets Lee, Wooyoung Lee, W 10 Yonsei Univ, Dept Mat Sci & Engn, 50 Yonsei Ro, Seoul 03722, South Korea kimdhwan@dgist.ac.kr;jkim@dgist.ac.kr;
Dependence of magnetic performance on coating method in grain boundary diffusion processed Nd-Fe-B sintered magnets Do, Dalhyun Do, D 11 Keimyung Univ, Dept Adv Mat Engn, 1095,Dalgubeol Daero, Daegu, South Korea kimdhwan@dgist.ac.kr;jkim@dgist.ac.kr;
Dependence of magnetic performance on coating method in grain boundary diffusion processed Nd-Fe-B sintered magnets Kim, Dong Hwan Kim, DH 12 교신저자 DGIST, Div Nanotechnol, 333 Techno Jungang Daero, Daegu 42988, South Korea kimdhwan@dgist.ac.kr;jkim@dgist.ac.kr;
Dependence of magnetic performance on coating method in grain boundary diffusion processed Nd-Fe-B sintered magnets Kim, Jeongmin Kim, J 13 교신저자 DGIST, Div Nanotechnol, 333 Techno Jungang Daero, Daegu 42988, South Korea kimdhwan@dgist.ac.kr;jkim@dgist.ac.kr;
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors Na, Jeong-Hyeon Na, JH 1 Kyungpook Natl Univ, Sch Elect & Elect Engn, 80 Daehakro, Daegu 41566, South Korea jh2jh3@naver.com;jeef12345@naver.com;qkrdnjs0320@naver.com;junhaosuhua@gmail.com;wnstn0812@naver.com;kein98@knu.ac.kr;sinhlee@knu.ac.kr;j1jang@knu.ac.kr;imkang@ee.knu.ac.kr;kdk7362@knu.ac.kr;jhbae@ee.knu.ac.kr;
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors Park, Jun-Hyeong Park, JH 2 Kyungpook Natl Univ, Sch Elect & Elect Engn, 80 Daehakro, Daegu 41566, South Korea jh2jh3@naver.com;jeef12345@naver.com;qkrdnjs0320@naver.com;junhaosuhua@gmail.com;wnstn0812@naver.com;kein98@knu.ac.kr;sinhlee@knu.ac.kr;j1jang@knu.ac.kr;imkang@ee.knu.ac.kr;kdk7362@knu.ac.kr;jhbae@ee.knu.ac.kr;
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors Park, Won Park, W 3 Kyungpook Natl Univ, Sch Elect & Elect Engn, 80 Daehakro, Daegu 41566, South Korea jh2jh3@naver.com;jeef12345@naver.com;qkrdnjs0320@naver.com;junhaosuhua@gmail.com;wnstn0812@naver.com;kein98@knu.ac.kr;sinhlee@knu.ac.kr;j1jang@knu.ac.kr;imkang@ee.knu.ac.kr;kdk7362@knu.ac.kr;jhbae@ee.knu.ac.kr;
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors Feng, Junhao Feng, JH 4 Kyungpook Natl Univ, Sch Elect & Elect Engn, 80 Daehakro, Daegu 41566, South Korea KZF-5875-2024 Feng, Junhao jh2jh3@naver.com;jeef12345@naver.com;qkrdnjs0320@naver.com;junhaosuhua@gmail.com;wnstn0812@naver.com;kein98@knu.ac.kr;sinhlee@knu.ac.kr;j1jang@knu.ac.kr;imkang@ee.knu.ac.kr;kdk7362@knu.ac.kr;jhbae@ee.knu.ac.kr;
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors Eun, Jun-Su Eun, JS 5 Kyungpook Natl Univ, Sch Elect & Elect Engn, 80 Daehakro, Daegu 41566, South Korea jh2jh3@naver.com;jeef12345@naver.com;qkrdnjs0320@naver.com;junhaosuhua@gmail.com;wnstn0812@naver.com;kein98@knu.ac.kr;sinhlee@knu.ac.kr;j1jang@knu.ac.kr;imkang@ee.knu.ac.kr;kdk7362@knu.ac.kr;jhbae@ee.knu.ac.kr;
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors Lee, Jinuk Lee, JN 6 Kyungpook Natl Univ, Sch Elect & Elect Engn, 80 Daehakro, Daegu 41566, South Korea jh2jh3@naver.com;jeef12345@naver.com;qkrdnjs0320@naver.com;junhaosuhua@gmail.com;wnstn0812@naver.com;kein98@knu.ac.kr;sinhlee@knu.ac.kr;j1jang@knu.ac.kr;imkang@ee.knu.ac.kr;kdk7362@knu.ac.kr;jhbae@ee.knu.ac.kr;
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors Lee, Sin-Hyung Lee, SH 7 Kyungpook Natl Univ, Sch Elect & Elect Engn, 80 Daehakro, Daegu 41566, South Korea ABD-6425-2022 Lee, Sin-Hyung jh2jh3@naver.com;jeef12345@naver.com;qkrdnjs0320@naver.com;junhaosuhua@gmail.com;wnstn0812@naver.com;kein98@knu.ac.kr;sinhlee@knu.ac.kr;j1jang@knu.ac.kr;imkang@ee.knu.ac.kr;kdk7362@knu.ac.kr;jhbae@ee.knu.ac.kr;
Dependence of Positive Bias Stress Instability on Threshold Voltage and Its Origin in Solution-Processed Aluminum-Doped Indium Oxide Thin-Film Transistors Jang, Jaewon Jang, J 8 Kyungpook Natl Univ, Sch Elect & Elect Engn, 80 Daehakro, Daegu 41566, South Korea 0000-0003-1908-0015 Jang, Jaewon jh2jh3@naver.com;jeef12345@naver.com;qkrdnjs0320@naver.com;junhaosuhua@gmail.com;wnstn0812@naver.com;kein98@knu.ac.kr;sinhlee@knu.ac.kr;j1jang@knu.ac.kr;imkang@ee.knu.ac.kr;kdk7362@knu.ac.kr;jhbae@ee.knu.ac.kr;
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