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2025 연구성과별 연구자 정보 (366 / 1187)

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Document Title Author Full Name Author Short Name Index Corresponding Address ResearcherID ResearcherID Author Name ORCID ORCID Author Name Related Email
Efficient visible-light-driven removal of persistent antibiotics and synthetic dyes from wastewater using an engineered 2D/2D Bi2MoO6/NiAl-LDH S-scheme heterocatalyst with enhanced interfacial contact Lee, Dong-Eun Lee, DE 1 Kyungpook Natl Univ, Sch Architecture Civil Environm & Energy Engn, 80 Daehak Ro, Daegu 41566, South Korea wkjo@knu.ac.kr; surendar.t86@gmail.com;
Efficient visible-light-driven removal of persistent antibiotics and synthetic dyes from wastewater using an engineered 2D/2D Bi2MoO6/NiAl-LDH S-scheme heterocatalyst with enhanced interfacial contact Moru, Satyanarayana Moru, S 2 VIT AP Univ, Sch Adv Sci, Amaravati 522237, Andhra Prades, India wkjo@knu.ac.kr; surendar.t86@gmail.com;
Efficient visible-light-driven removal of persistent antibiotics and synthetic dyes from wastewater using an engineered 2D/2D Bi2MoO6/NiAl-LDH S-scheme heterocatalyst with enhanced interfacial contact Jo, Wan-Kuen Jo, WK 3 교신저자 Kyungpook Natl Univ, Sch Architecture Civil Environm & Energy Engn, 80 Daehak Ro, Daegu 41566, South Korea AAO-5329-2020 Jo, Wan wkjo@knu.ac.kr; surendar.t86@gmail.com;
Efficient visible-light-driven removal of persistent antibiotics and synthetic dyes from wastewater using an engineered 2D/2D Bi2MoO6/NiAl-LDH S-scheme heterocatalyst with enhanced interfacial contact Tonda, Surendar Tonda, S 4 교신저자 Kyungpook Natl Univ, Sch Architecture Civil Environm & Energy Engn, 80 Daehak Ro, Daegu 41566, South Korea AAO-3358-2020 Tonda, Surendar 0000-0002-9062-4700 Tonda, Surendar wkjo@knu.ac.kr; surendar.t86@gmail.com;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Cho, Yoonjin Cho, Y 1 Kyungpook Natl Univ, Sch Elect & Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Lee, Sangwoo Lee, S 2 Kyungpook Natl Univ, Sch Elect & Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Heo, Seongwon Heo, S 3 Kyungpook Natl Univ, Sch Elect & Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Choi, Suhyeon Choi, S 4 Kyungpook Natl Univ, Sch Elect & Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Bae, Jin-Hyuk Bae, JH 5 Kyungpook Natl Univ, Sch Elect & Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Bae, Jin-Hyuk Bae, JH 5 Kyungpook Natl Univ, Sch Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Kang, In-Man Kang, IM 6 Kyungpook Natl Univ, Sch Elect & Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Kang, In-Man Kang, IM 6 Kyungpook Natl Univ, Sch Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Kim, Kwangeun Kim, K 7 Korea Aerosp Univ, Sch Elect & Informat Engn, Goyang 10540, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Lee, Won-Yong Lee, WY 8 교신저자 Kyungpook Natl Univ, Inst Elect Technol, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
Electrically and environmentally stable nitric acid-assisted SnO2 films for the active channel layer of thin-film transistors Jang, Jaewon Jang, J 9 교신저자 Kyungpook Natl Univ, Sch Elect & Elect Engn, Daegu 41566, South Korea yongsz@knu.ac.kr; j1jang@knu.ac.kr;
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