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2023 연구성과별 연구자 정보 (209 / 2675)
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| Document Title | Author Full Name | Author Short Name | Index | Corresponding | Address | ResearcherID | ResearcherID Author Name | ORCID | ORCID Author Name | Related Email |
|---|---|---|---|---|---|---|---|---|---|---|
| AMBITION: Ambient Temperature Aware VM Allocation for Edge Data Centers | Chung, Sung Woo | Chung, SW | 5 | Korea Univ, Dept Comp Sci & Engn, Seoul 02841, South Korea | younggeun_kim@korea.ac.kr; | |||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Lee, Ga Yeon | Lee, GY | 1 | Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, Daejeon 34114, South Korea | I-9382-2017 | lee, ga | 0000-0001-9841-644X | Lee, Ga Yeon | tmchung@krict.re.kr; | |
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Lee, Seung-Hun | Lee, SH | 2 | Hanbat Natl Univ, Dept Adv Mat Engn, Daejeon 34158, South Korea | tmchung@krict.re.kr; | |||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Jo, In Ho | Jo, IH | 3 | Hanbat Natl Univ, Dept Adv Mat Engn, Daejeon 34158, South Korea | tmchung@krict.re.kr; | |||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Cho, Chan-Mi | Cho, CM | 4 | Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, Daejeon 34114, South Korea | tmchung@krict.re.kr; | |||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Shostak, Svetlana | Shostak, S | 5 | Kyungpook Natl Univ, Dept Chem, Daegu 41566, South Korea | tmchung@krict.re.kr; | |||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Ryu, Ji Yeon | Ryu, JY | 6 | Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, Daejeon 34114, South Korea | LZI-4876-2025 | Ryu, Ji Yeon | 0000-0001-6321-5576 | Ryu, Ji Yeon | tmchung@krict.re.kr; | |
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Park, Bo Keun | Park, BK | 7 | Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, Daejeon 34114, South Korea | AFT-6345-2022 | Park, Bo | 0000-0002-4066-0500 | Park, Bo Keun | tmchung@krict.re.kr; | |
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Park, Bo Keun | Park, BK | 7 | Univ Sci & Technol UST, Dept Chem Convergence Mat, Daejeon 34113, South Korea | AFT-6345-2022 | Park, Bo | 0000-0002-4066-0500 | Park, Bo Keun | tmchung@krict.re.kr; | |
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Son, Seung Uk | Son, SU | 8 | Sungkyunkwan Univ, Dept Chem, Suwon 16419, Gyeonggi Do, South Korea | tmchung@krict.re.kr; | |||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Choi, Cheol Ho | Choi, CH | 9 | Kyungpook Natl Univ, Dept Chem, Daegu 41566, South Korea | tmchung@krict.re.kr; | |||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Eom, Taeyong | Eom, T | 10 | Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, Daejeon 34114, South Korea | 0000-0002-9646-9553 | Eom, Taeyong | tmchung@krict.re.kr; | |||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Kim, Jeong Hwan | Kim, JH | 11 | Hanbat Natl Univ, Dept Adv Mat Engn, Daejeon 34158, South Korea | tmchung@krict.re.kr; | |||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Chung, Taek-Mo | Chung, TM | 12 | 교신저자 | Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, Daejeon 34114, South Korea | tmchung@krict.re.kr; | ||||
| Amidoxime-Containing Zr and Hf Atomic Layer Deposition Precursors for Metal Oxide Thin Films | Chung, Taek-Mo | Chung, TM | 12 | 교신저자 | Univ Sci & Technol UST, Dept Chem Convergence Mat, Daejeon 34113, South Korea | tmchung@krict.re.kr; |
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