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2023 연구자 정보 (871 / 1135)

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Author Name 제1저자 여부 교신저자 여부 Address ResearcherID ORCID Paper Title WoS Edition 최상위 JCR(%) WoS Category Related Email
Sung, Jae-Yoon
(Sung, JY)
Yonsei Univ, Dept Biotechnol, Seoul, South Korea
0000-0002-2475-8743
Sung, Jae-Yoon
[JCR상위 37.6] A Retro-Aldol Reaction Prompted the Evolvability of a Phosphotransferase System for the Utilization of a Rare Sugar SCIE 37.6 MICROBIOLOGY leehicam@yonsei.ac.kr;
Amir, Walid
(Amir, W)
제1저자 Univ Ulsan, Dept Elect Elect & Comp Engn, Ulsan 44610, South Korea
Univ Ulsan, Dept Elect Elect & Comp Engn, Ulsan, South Korea

0000-0002-2060-7104
Amir, Walid
[JCR상위 37.7] Performance Enhancement of AlGaN/GaN HEMT via Trap-State Improvement Using O2 Plasma Treatment
[JCR상위 73.5] Precise channel temperature prediction in AlGaN/GaN HEMTs via closed-form empirical expression
SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED
ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED;PHYSICS, CONDENSED MATTER
dae-hyun.kim@ee.knu.ac.kr;twkim78@ulsan.ac.kr;
Baek, Ji-Min
(Baek, JM)
Kyungpook Natl Univ, Dept Elect & Elect Engn, Daegu 41566, South Korea

[JCR상위 37.7] Sub-50 nm Terahertz In0.8Ga0.2As Quantum-Well High-Electron-Mobility Transistors for 6G Applications SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED dae-hyun.kim@ee.knu.ac.kr;
Cha, Eunjung
(Cha, E)
제1저자 Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
IBM Res Zurich, CH-8803 Ruschlikon, Switzerland
AAL-6036-2020
Cha, Eunjung
0000-0001-5818-3274
Cha, Eunjung
[JCR상위 37.7] Optimization of Channel Structures in InP HEMT Technology for Cryogenic Low-Noise and Low-Power Operation SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED cha@zurich.ibm.com;wadefalk@lownoisefactory.com;dae-hyun.kim@ee.knu.ac.kr;jan.grahn@chalmers.se;
Chakraborty, Surajit
(Chakraborty, S)
Univ Ulsan, Dept Elect Elect & Comp Engn, Ulsan 44610, South Korea
Univ Ulsan, Dept Elect Elect & Comp Engn, Ulsan, South Korea
IXD-2458-2023
Chakraborty, Surajit
0000-0002-2566-0027
Chakraborty, Surajit
[JCR상위 37.7] Performance Enhancement of AlGaN/GaN HEMT via Trap-State Improvement Using O2 Plasma Treatment
[JCR상위 73.5] Precise channel temperature prediction in AlGaN/GaN HEMTs via closed-form empirical expression
SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED
ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED;PHYSICS, CONDENSED MATTER
dae-hyun.kim@ee.knu.ac.kr;twkim78@ulsan.ac.kr;
Cho, Chu-Young
(Cho, CY)
Korea Adv Nano Fab Ctr, Suwon 16229, Gyeonggi Do, South Korea

[JCR상위 37.7] Performance Enhancement of AlGaN/GaN HEMT via Trap-State Improvement Using O2 Plasma Treatment SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED dae-hyun.kim@ee.knu.ac.kr;twkim78@ulsan.ac.kr;
Choi, Ji-Won
(Choi, JW)
ILSUNG Plating Co Ltd, R&D Ctr, Daegu 42697, South Korea
0000-0001-8825-5005
Choi, Ji-Won
[JCR상위 37.7] Effects of Organic Additives on Alkaline Non-Cyanide Zinc Electroplating
[JCR상위 24.0] Concentration Influence of Complexing Agent on Electrodeposited Zn-Ni Alloy
SCIE 24.0 MATERIALS SCIENCE, COATINGS & FILMS;MATERIALS SCIENCE, MULTIDISCIPLINARY;PHYSICS, APPLIED
CHEMISTRY, MULTIDISCIPLINARY;ENGINEERING, MULTIDISCIPLINARY;MATERIALS SCIENCE, MULTIDISCIPLINARY;PHYSICS, APPLIED
milk3275@naver.com;lsung70@ilsung70.com;rhrwl6@naver.com;ijson@knu.ac.kr;
ilsung70@ilsung70.com;rhrwl6@naver.com;milk3275@naver.com;ijson@knu.ac.kr;
Choi, Su-Min
(Choi, SM)
Kyungpook Natl Univ, Daegu, South Korea
Kyungpook Natl Univ, Dept Elect & Elect Engn, Daegu 41566, South Korea


A W-Band Low-Noise Amplifier in 50-nm InP HEMT Technology
[JCR상위 37.7] Sub-50 nm Terahertz In0.8Ga0.2As Quantum-Well High-Electron-Mobility Transistors for 6G Applications
SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED wchoi@okstate.edu;
dae-hyun.kim@ee.knu.ac.kr;
George, Sethu
(George, S)
Kyungpook Natl Univ, Dept Elect & Elect Engn, Daegu 41566, South Korea JVO-6743-2024
George, Sethu Merin

[JCR상위 37.7] Sub-50 nm Terahertz In0.8Ga0.2As Quantum-Well High-Electron-Mobility Transistors for 6G Applications SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED dae-hyun.kim@ee.knu.ac.kr;
Grahn, Jan
(Grahn, J)
교신저자 Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
0000-0002-5439-870X
Grahn, Jan
[JCR상위 37.7] Optimization of Channel Structures in InP HEMT Technology for Cryogenic Low-Noise and Low-Power Operation SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED cha@zurich.ibm.com;wadefalk@lownoisefactory.com;dae-hyun.kim@ee.knu.ac.kr;jan.grahn@chalmers.se;
Hoshi, Takuya
(Hoshi, T)
NTT Corp, NTT Device Technol Labs, Atsugi, Kanagawa 2430198, Japan
NTT Corp, NTT Device Technol Labs, Kanagawa 2430198, Japan
JRZ-1293-2023
Hoshi, Takuya
0009-0007-5643-1423
Hoshi, Takuya
[JCR상위 37.7] Performance Enhancement of AlGaN/GaN HEMT via Trap-State Improvement Using O2 Plasma Treatment
[JCR상위 73.5] Precise channel temperature prediction in AlGaN/GaN HEMTs via closed-form empirical expression
SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED
ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED;PHYSICS, CONDENSED MATTER
dae-hyun.kim@ee.knu.ac.kr;twkim78@ulsan.ac.kr;
Jang, Jun Tae
(Jang, JT)
Kookmin Univ, Sch Elect Engn, Seoul 02707, South Korea
0000-0003-3891-2112
Jang, Jun Tae
[JCR상위 37.7] Read Disturbance in Cross-Point Phase-Change Memory Arrays-Part II: Array Simulations Considering External Currents
[JCR상위 32.7] Understanding ovonic threshold switching of GeSe chalcogenide materials using electrical methodologies for extracting density of states
[JCR상위 37.7] Read Disturbances in Cross-Point Phase-Change Memory Arrays- Part I: Physical Modeling With Phase-Change Dynamics
SCIE 32.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED
PHYSICS, APPLIED
jiyong.woo@knu.ac.kr;drlife@kookmin.ac.kr;
jiyong.woo@knu.ac.kr;drlift@kookmin.ac.kr;
Jeon, Su-Byung
(Jeon, SB)
제1저자 Kyungpook Natl Univ, Dept Mat Sci & Met Engn, Daegu 41566, South Korea
ILSUNG Plating Co Ltd, R&D Ctr, Daegu 42697, South Korea

0000-0003-4865-2406
Jeon, Su Byung
[JCR상위 37.7] Effects of Organic Additives on Alkaline Non-Cyanide Zinc Electroplating
[JCR상위 24.0] Concentration Influence of Complexing Agent on Electrodeposited Zn-Ni Alloy
SCIE 24.0 MATERIALS SCIENCE, COATINGS & FILMS;MATERIALS SCIENCE, MULTIDISCIPLINARY;PHYSICS, APPLIED
CHEMISTRY, MULTIDISCIPLINARY;ENGINEERING, MULTIDISCIPLINARY;MATERIALS SCIENCE, MULTIDISCIPLINARY;PHYSICS, APPLIED
milk3275@naver.com;lsung70@ilsung70.com;rhrwl6@naver.com;ijson@knu.ac.kr;
ilsung70@ilsung70.com;rhrwl6@naver.com;milk3275@naver.com;ijson@knu.ac.kr;
Jeong, Hyeon-Seok
(Jeong, HS)
Kyungpook Natl Univ, Dept Elect & Elect Engn, Daegu 41566, South Korea

[JCR상위 37.7] Sub-50 nm Terahertz In0.8Ga0.2As Quantum-Well High-Electron-Mobility Transistors for 6G Applications SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED dae-hyun.kim@ee.knu.ac.kr;
Kang, Seung-Youl
(Kang, SY)
Elect & Telecommun Res Inst, Daejeon 34129, South Korea JDD-8544-2023
Kang, Seung-Youl

[JCR상위 37.7] Experimental Robust Spontaneous Synchronizations in Coupled NbOx Oscillation Neurons for Unconventional Computing SCIE 37.7 ENGINEERING, ELECTRICAL & ELECTRONIC;PHYSICS, APPLIED jiyong.woo@knu.ac.kr;
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